Plasma surface treatment is to ionize the gas into plasma by applying sufficient energy to it. The "active" components of plasma include: ions, electrons, atoms, active genes, etc. Plasma treatment is to use the properties of these active components to treat the surface of the sample, so as to achieve cleaning, modification, etching and other purposes.
The structure of the vacuum plasma cleaning machine is mainly divided into five components: control system, excitation power system, vacuum chamber, process gas system, and vacuum pump system.
（A）Control System:The role of the control system is to control the operation of the entire atmospheric low-temperature plasma cleaning equipment and the protection of the overall system.
（B）Excitation power system:The generation of plasma requires high voltage excitation. Vacuum plasma is excited by radio frequency power supply (0-1000W) or intermediate frequency power supply (0-2000W). The frequency of radio frequency power supply is 13.56MHz, and the frequency of intermediate frequency power supply is 40KHz. The parameters can be adjusted according to the actual situation of the sample, and the modification effect can be achieved.
（C）Vacuum cavity:The role of the control system is to control the operation of the entire atmospheric low-temperature plasma cleaning equipment and the protection of the overall system.
The vacuum chamber is mainly divided into three materials: ①Stainless steel vacuum chamber ②Quartz chamber ③High-strength aluminum alloy chamber
Electrode plate placement method: ① Flat horizontal electrode type ② Flat vertical electrode type
Choose the cavity material and electrode plate placement method according to different industries and application fields.
（D）Process gas system:Standard two-way process gas, according to the different cleaning materials, can choose argon, oxygen, nitrogen, hydrogen, carbon tetrafluoride gas.
（E）Vacuum pump system:The vacuum pump group is mainly divided into three types: ①oil pump ②Roots pump ③dry pump
The speed of vacuuming is one of the important factors that determine the working efficiency of a vacuum plasma cleaner. The speed of vacuuming mainly depends on the vacuum pump. The vacuum pump set is configured according to the vacuum degree and volume requirements of the measured sample.
