Infrared halogen lamp tube is heated and cooled by air cooling；
PID temperature control of lamp power can accurately control temperature rise；
Adopt parallel gas path inlet to avoid cold spots during annealing；
Three sets of process gases are standard；
Both atmospheric and vacuum treatment methods can be selected, and the gas is purified before intake.
Product description
Specification parameters
Hardware options
RTP-Table-6 is a desktop 6-inch wafer Rapid Thermal Processing. It uses upper and lower layers of infrared halogen lamps as heat sources to heat the internal quartz cavity for insulation. The cavity shell is made of water-cooled aluminum alloy, allowing the product to be heated evenly and the surface temperature is low.RTP-Table-6 adopts PID control, and the system can quickly adjust the output power of infrared halogen tubes, making the temperature control more accurate.
Working Principle
Ion implantation annealing
Rapid annealing after ITO coating
oxide
nitride growth
Silicide alloy annealing
GaAs process
Ohmic contact fast alloy
Oxidation reflux
Other semiconductor rapid heat treatment processes
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